
SC-BRUSH-RFQ
Entegris Planarcore · CMP PVA Cleaning Brushes
Material: PVA · Process: Post-CMP · Configuration: Molded-through-the-core
Price to be confirmed
CMP & Wafer Cleaning. Price, availability, exact configuration and delivery are confirmed by quotation.
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Entegris Planarcore · CMP PVA Cleaning Brushes
Material: PVA · Process: Post-CMP · Configuration: Molded-through-the-core

Qnity IC1000 · CMP Polishing Pads
Grade: IC1000 / IC1010 · Process: Cu / W / STI / Oxide

3M A165 · CMP Pad Conditioners
Material: 304 SS · Size: 4.25 in (107.95 mm) · Surface / shape: 251 µm diamond

FUJIMI PLANERLITE 7000 · CMP Slurries
Material: Colloidal silica · Process: Cu damascene CMP

Entegris PlanarClean AG · Wafer Cleaning Solutions
Process: Cu post-CMP · Configuration: Formulated solution